Search results for "Electron beam physical vapor deposition"
showing 5 items of 5 documents
Effect of the surface stoichiometry on the interaction of Mo with TiO2 (110)
2000
Abstract Molydenum has been deposited at room temperature on (110) TiO2 surfaces with different stoichiometries, roughnesses and crystallinities. Whatever the substrate preparation is, in-situ Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) studies as well as ex-situ atomic force microscopy (AFM) and reflexion high-energy electron diffraction (RHEED) studies reveal a Stranski–Krastanov growth mode: the completion of three monolayers followed by islands growth is observed in every case. The three monolayers are always composed of amorphous molybdenum oxide with an oxidation state of molybdenum less than IV. The oxidation of the molybdenum layers generates Ti3+ an…
Investigations of TiO2 films deposited by different techniques
1991
High refractive TiO2 films deposited by reactive electron beam evaporation, reactive ion plating and dip coating have been characterized by optical spectroscopy, electron spectroscopy for chemical analysis, Rutherford backscattering spectroscopy, nuclear reaction analysis and Raman spectroscopy. The spectral refractive index n exhibits a strong dependence on the deposition conditions. These findings will be connected to variations in density, stoichiometry, hydrogen content (H2O) and binding structure of the layers. A strong correlation is found between optical quantities and microscopic properties of TiO2 films.
Metal-organic chemical vapor deposition of Cr2O3 and Nd2O3 coatings. Oxide growth kinetics and characterization
2000
Thin oxide films of Cr2O3 and Nd2O3 were prepared, using Metal-Organic Chemical Vapor Deposition (MOCVD) technique, to protect stainless steels against corrosion at high temperature. The conditions of precursor volatilization were studied by thermogravimetry. Deposited film growth kinetics depended on the deposition parameters, particularly substrate temperature, gas flow rate and location of substrate in the coating reactor. The influence of the deposition parameters on the deposition rate and the uniformity of the films is discussed. The oxide films were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), transmission electron microscopy (TEM) and atomic force mi…
Growth of Fe nanostructures
2004
Abstract Highly ordered arrays of epitaxial iron thin film nanostructures were grown by molecular beam epitaxy techniques on m-plane sapphire α-Al2O3 (1 0 1 0) substrates. Iron was deposited by electron beam evaporation under shallow incidence onto faceted sapphire substrates held at elevated temperatures of 450°C. Scanning electron microscopy suggests the formation of morphologically and electrically isolated nanowire structures on the ridges of the facets. The topology of the structures depends strongly on the iron deposition angle.
Coating and functionalization of high density ion track structures by atomic layer deposition
2016
In this study flexible TiO 2 coated porous Kapton membranes are presented having electron multiplication properties. 800 nm crossing pores were fabricated into 50 m thick Kapton membranes using ion track technology and chemical etching. Consecutively, 50 nm TiO 2 films were deposited i nto the pores of the Kapton membranes by atomic layer deposition using Ti( i OPr) 4 and water as precursors at 250 °C. The TiO 2 films and coated membranes were studied by scanning electro n microscopy (SEM), X - ray diffraction (XRD) and X - ray reflectometry (XRR). Au metal electrod e fabrication onto both sides of the coated foils was achieved by electron beam evaporation. The electron multipliers were o…